Publication: Investigation of the Treatability of Diclofenac by Photochemical Advanced Oxidation Processes
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Abstract
The drug selected in this study is diclofenac which has the highest acute toxicity among all of the anti-inflammatory drugs. In this study, UV was integrated with different oxidants (UV/H<inf>2</inf>O<inf>2</inf>, UV/TiO<inf>2</inf>, UV/ZnO), to study the removal efficiency of diclofenac. Synthetic wastewater containing diclofenac drug were treated with the help of UV, UV/H<inf>2</inf> O<inf>2,</inf> UV/TiO<inf>2</inf> and UV/ZnO methods by taking samples at different time intervals of 0-10-20-30-40-50-60 minutes. Different solutions of diclofenac were prepared with concentrations of, 50mg/L, >99.99mg /l, 200mg/L, 400mg/L and 800mg/L for treated with UV and UV/H<inf>2</inf>O<inf>2</inf> for UV/TiO<inf>2</inf> and UV/ZnO solutions were prepared with concentrations 40, 80, 160, 240 and 320mg/L. Diclofenac concentration was analyzed by Liquid Chromatography Mass Spectrometry (LCMS/MS) and organic pollutants were analyzed by Total Organic Carbon (TOK) device. The other operating conditions remained the same in all systems. In case of 200 mg/L, LC-MS/MS analysis showed UV removal efficiency was 55.23% and UV/H<inf>2</inf>O<inf>2</inf> removal was >99.99%. TOC results showed that 30.71% diclofenac removal with UV and 97% with UV/H<inf>2</inf>O<inf>2</inf> removal, in case of 800 mg/L concentration. In case of 320mg/L, TOC analysis showed that UV/TiO<inf>2</inf> and UV/ZnO processes removal efficiency were respectively 93.23% and 96.10%. LC-MS/MS analysis results showed that >99.99% removal efficiency at 240 mg/L in both of TiO<inf>2</inf> and ZnO concentrations. According to the results, while the effectiveness of the UV process alone is 10-30%, more effective removal efficiency (%60->99.99) was obtained in combinations such as UV/ZnO, UV/TiO<inf>2</inf>, UV/H<inf>2</inf>O<inf>2</inf>. In terms of cost, optimum process UV/H<inf>2</inf>O<inf>2</inf> (200 mg/L) process was found. © 2020, TUBITAK. All rights reserved.
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WoS Q
Scopus Q
Q4
Source
El-Cezeri Journal of Science and Engineering
Volume
7
Issue
3
Start Page
1110
End Page
1121
