Basit öğe kaydını göster

dc.contributor.authorDegirmenci, Isa
dc.contributor.authorCoote, Michelle L.
dc.date.accessioned2020-06-21T13:33:55Z
dc.date.available2020-06-21T13:33:55Z
dc.date.issued2016
dc.identifier.issn1089-5639
dc.identifier.urihttps://doi.org/10.1021/acs.jpca.6b00538
dc.identifier.urihttps://hdl.handle.net/20.500.12712/13432
dc.descriptionCoote, Michelle/0000-0003-0828-7053; Coote, Michelle L/0000-0003-0828-7053; DEGIRMENCI, ISA/0000-0002-2708-7930en_US
dc.descriptionWOS: 000372562200013en_US
dc.descriptionPubMed: 26932454en_US
dc.description.abstractHigh-level ab initio calculations have been used to compare prototypical thiyl, alkoxyl, and alkyl radical addition reactions. Thiyl radical addition to the sulfur center of thioketones is exothermic and rapid, occurring with negative enthalpic barriers and only weakly positive Gibbs free energy barriers. In stark contrast, alkoxyl radical addition to the oxygen center of ketones is highly endothermic and occurs with very high reaction barriers, though these are also suppressed. On the basis of analysis of the corresponding alkyl radical additions to these substrates and the corresponding reactions of these heteroatom radicals with alkenes, it suggested that addition reactions involving thiyl radicals have low intrinsic barriers because their unpaired electrons are better able to undergo stabilizing resonance interactions with the pi* orbitals of the substrate in the transition state.en_US
dc.description.sponsorshipScientific and Technological Research Council of Turkey (TUBITAK)Turkiye Bilimsel ve Teknolojik Arastirma Kurumu (TUBITAK) [2219]; Australian Research Council Centre of Excellence for Electromaterials ScienceAustralian Research Councilen_US
dc.description.sponsorshipI.D. gratefully acknowledges the Scientific and Technological Research Council of Turkey (TUBITAK) under 2219 grant and Naomi Haworth for her valuable support. M.L.C gratefully acknowledges generous allocations of supercomputing time on the National Facility of the Australian National Computational Infrastructure and financial support from the Australian Research Council Centre of Excellence for Electromaterials Science.en_US
dc.language.isoengen_US
dc.publisherAmer Chemical Socen_US
dc.relation.isversionof10.1021/acs.jpca.6b00538en_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.titleComparison of Thiyl, Alkoxyl, and Alkyl Radical Addition to Double Bonds: the Unusual Contrasting Behavior of Sulfur and Oxygen Radical Chemistryen_US
dc.typearticleen_US
dc.contributor.departmentOMÜen_US
dc.identifier.volume120en_US
dc.identifier.issue10en_US
dc.identifier.startpage1750en_US
dc.identifier.endpage1755en_US
dc.relation.journalJournal of Physical Chemistry Aen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


Bu öğenin dosyaları:

DosyalarBoyutBiçimGöster

Bu öğe ile ilişkili dosya yok.

Bu öğe aşağıdaki koleksiyon(lar)da görünmektedir.

Basit öğe kaydını göster