Light transmittance and surface roughness of a feldspathic ceramic CAD-CAM material as a function of different surface treatments

Abstract

Background: The aim of the present study was to determine the effect of different surface treatments on light transmission of aesthetic feldspathic ceramics used in CAD-CAM chairside restorations. Methods: Forty eight feldspatic ceramic test specimens were prepared from prefabricated CAD-CAM blocks by using a slow speed diamond saw. Test specimens were prepared and divided into 4 groups (n = 12). In the control group, no surface treatments were applied on the feldspathic ceramic surfaces. In the hydrofluoric acid group, the bonding surfaces of feldspathic ceramics were etched with 9.5 % hydrofluoric acid. In the sandblasting group the feldspathic ceramic surfaces were air-abraded with 30-mu m alumium oxide (Al2O3) particles and Er: YAG laser was used to irradiate the ceramic surfaces. The incident light power given by the LED device and the transmitted light power through each ceramic sample was registered using a digital LED radiometer device. Each polymerization light had a light guide with 8-mm-diameter tips. Light transmission of feldspathic ceramic samples was determined by placing it on the radiometer and irradiating the specimen for 10 s at the highest setting for each light polymerization. All specimens were coated with gold using a sputter coater and examined under a field emission scanning electron microscope. Surface roughness measurement each group were evaluated with 3D optical surface and tactile profilometers. Results: One-way ANOVA test results revealed that both surface conditioning method significantly affect the light transmittance (F:412.437; p < 0.001) and the surface roughness values (F:16.386; p < 0.001). Al2O3 and Er-YAG laser application reduced the light transmission significantly (p < 0.05). Conclusions: The laser and Al2O3 applications reduced the light transmission of 1.5 mm thickness feldspathic ceramic material below the value of 400 mW/cm(2) which is critical limit for safe polymerization.